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Effect of growth pressure on coalescence thickness and crystal quality of GaN deposited on 4H–SiC

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dc.contributor.authorPiotr Caban
dc.contributor.authorWlodek Strupinski
dc.contributor.authorJan Szmidt
dc.contributor.authorMarek Wojcik
dc.contributor.authorJaroslaw Gaca
dc.contributor.authorOzgur Kelekci
dc.contributor.authorDeniz Caliskan
dc.contributor.authorEkmel Ozbay
dc.date.accessioned2024-07-11T07:47:41Z
dc.date.available2024-07-11T07:47:41Z
dc.date.issued2011-01
dc.identifier.doi10.1016/j.jcrysgro.2010.09.058
dc.identifier.urihttps://acikarsiv.thk.edu.tr/handle/123456789/1989
dc.publisherElsevier BV
dc.relation.ispartofJournal of Crystal Growth
dc.relation.issn0022-0248
dc.titleEffect of growth pressure on coalescence thickness and crystal quality of GaN deposited on 4H–SiC
dc.typejournal-article
dspace.entity.typePublication
oaire.citation.issue1
oaire.citation.volume315

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